Fuhe Li, Marjorie K. Balazs, and Scott Anderson
Journal of The Electrochemical Society
The effects of ambient and dissolved oxygen concentration in ultrapure water UPW on native oxide growth were studied at room temperature using a silicon 100 surface. Studies focused on the initial stage of the surface oxidation immediately after the HF cleaning. The silicon surfaces were exposed at a fixed duration to the UPW with different dissolved oxygen concentrations, open air, and dry nitrogen, respectively. Read more