Dan Cowles, Ph.D. and David Bollinger
Proceedings of the Semiconductor Pure Water and Chemicals Conference (SPWCC)
February 2004
A class of chemicals widely used in semiconductor processing is that of reactive, liquefied gases, such as dichlorosilane, trichlorosilane, anhydrous ammonia, and anhydrous HF. Delivery of these corrosive gases to the point-of-use, in a manner that avoids contamination by metallic elements, is an ongoing challenge. This paper describes a sampling approach that has been applied to metal impurity analysis in a broad range of corrosive, liquefied gases. Read more