Theresa Chu and Marjorie K. Balazs
Proceedings of the Semiconductor Pure Water and Chemicals Conference (SPWCC)
March 1993
The presence of colloidal silica in ultrapure water can cause silica residue to remain on water surfaces which later adversely affects the integrity of a semiconductor device. A general accepted approach to measuring colloidal silica is to take the difference between the values of a total silica and a dissolved silica measurement. In this study, there different techniques, colorimetry, ICP-AES and ICP-MS, were developed and evaluated for measuring total silica at ppb levels. Read more