Fuhe Li and Scott Anderson
CP1173, Frontiers of Characterization and Metrology for Nanoelecronics
Characterization of semiconductor thin films has long been determined by a number of traditional surface analysis techniques, Auger, ESCA/XPS, SEM-EDS and SIMS, to name a few. In this paper, we will discuss the applications of two-dimensional material analysis techniques for semiconductor and PV applications, glow discharge optical emission spectroscopy (RF GD-OES) and laser ablation plasma mass spectrometry (LA ICP-MS). Read more