Dr. Fuhe Li and Dr. Scott Anderson
Analytical Insight
Spring 2006
As geometry size enters the 65nm and 45nm technology nodes and ultra low energy (ULE) ion implantation becomes standard, there are needs for an alternative dose analysis methodology. Although typically the domain of SIMS, the coupling of laser ablation (LA) for sampling and detection via inductively coupled plasma (ICP) mass spectrometry (MS) as SARISTM LA-ICP-MS permits advantages and functionality not previously available. Read more