Analytical Insight
Spring 2009
In meeting today’s integrated circuit design specifications, resist development is a critical process that must be controlled to minimize critical dimension variation. Tetramethyl ammonium hydroxide (TMAH) is a long-used developer in this process, and tight control over TMAH developer specifications has been in use for many years. Current specifications for TMAH are in the 0.2 to 0.3 Normal concentrations (~2.2 to 2.4 % (w/w)), with the variability approaching +/- 0.0005 N. As specifications and required precision are always becoming more stringent in the semiconductor industry, Balazs has developed best-in-class chemical titrations to assure customers that their TMAH developer is in specification and in control for developer concentration.  Read more