Analytical Insight
Summer 2009
The importance of metal contamination in semiconductor processing and the ultimate yield effects has long been understood in the fab. One particular method used to measure metallic contamination is Vapor Phase Decomposition (VPD) in combination with Inductively Coupled Plasma Mass Spectrometry (ICP-MS). With this technique low detection limits (107atoms/cm2) can be obtained for metals across the periodic table. Read more